在處理一件美國申請的中國國內同族的答辯時,因為美國階段就很複雜,涉及的專利申請及專利很多,所以就查了這篇專利的引證關係,一查之下不得了,下面列出的就是專利族資訊,所涉專利多得讓人瞠目結舌。
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US2010317556A1 Two-Phase Substrate Cleaning Material |
US2010059088A1 Method and Apparatus for Removing Contamination from Substrate |
US2006128590A1 Method for removing contamination from a substrate and for making a cleaning solution |
US2006128600A1 Cleaning compound and method and system for using the cleaning compound |
US2007087950A1 Method and system for using a two-phases substrate cleaning compound |
US7696141B2 Cleaning compound and method and system for using the cleaning compound |
US2010206340A1 Method for Removing Contamination from a Substrate and for Making a Cleaning Solution |
US7737097B2 Method for removing contamination from a substrate and for making a cleaning solution |
US2007079848A1 Method and apparatus for removing contamination from substrate |
US2007084483A1 METHOD AND APPARATUS FOR CLEANING A SEMICONDUCTOR SUBSTRATE |
US2007084485A1 METHOD AND APPARATUS FOR CLEANING A SEMICONDUCTOR SUBSTRATE |
US7648584B2 Method and apparatus for removing contamination from substrate |
US2010313918A1 Apparatus for Cleaning Contaminants from Substrate |
US7799141B2 Method and system for using a two-phases substrate cleaning compound |
US20100705445 Cleaning Compound and Method and System for Using the Cleaning Compound |
US20100862072 Two-Phase Substrate Cleaning Material |
US20090620288 Method and Apparatus for Removing Contamination from Substrate |
US20060346894 Method for removing contamination from a substrate and for making a cleaning solution |
US20060347154 Cleaning compound and method and system for using the cleaning compound |
US20060519354 Method and system for using a two-phases substrate cleaning compound |
US20100768349 Method for Removing Contamination from a Substrate and for Making a Cleaning Solution |
US20060336215 Method and apparatus for removing contamination from substrate |
US20060612352 METHOD AND APPARATUS FOR CLEANING A SEMICONDUCTOR SUBSTRATE |
US20060612371 METHOD AND APPARATUS FOR CLEANING A SEMICONDUCTOR SUBSTRATE |
US20100862091 Apparatus for Cleaning Contaminants from Substrate |
有一天跟上海企業內的同行們談起這個話題時,大家最關心的也是如何進行專利佈局。同時,也談到企業內老總們的短視。前陣子有個朋友在聊天時告訴我,上海知識產權局的局長給他們培訓座談時說了一句話:「我們上海知識產權局,包括國家知識產權局,都不清楚你們企業到底需要什麼了」。是的,近年專利的推動,還主要靠政府及專利資助政策,於是應運而生了一大批專案申報專員,為的是把政府資助弄到手,為企業省錢;但是項目完成後,就不再過問專利的前途了。政府有在推動專利資料庫,但是作出來了,企業不會運用,會運用的又嫌不夠有針對性。所有的初衷都沒有讓企業走上正視專利的道路,政府真的是沒招了。
必須重視起來
但是,在行業待久了就會發現,我們已經身處於一個國際大環境了,國外企業的專利情報系統多麼發達,只要你申請了對他們造成危險的專利,他們馬上就會得知並且快速作出反應;你如果有專利出售,他們馬上就把你企業的內部情況查得一清二楚,從而找出談判的籌碼;你要佔領他的市場,在他的領域內分一杯羹,他會把你扼殺在搖籃裡,這一切都是市場導向的。專利如果運用得好,其實是非常有意思的工作。